B-11 in the form of Boron Trifluoride Gas for Semiconductor Manufacture
Boron trifluoride gas is the ideal silicon wafer dopant for the production of highly integrated, high-density
microchips. 11BF3 provides for greater efficiency and increased production throughput, and helps to make
chips smaller and better.
Ventanas de suministro semanal
Calibrado a su fecha de entrega, enviado de reactores calificados y socios cGMP.