Request a Quote Ask a specialist
Ge-74 in the form of Germanium
Tetrafluoride gas is used as preamorphic implant to
prevent silicon wafer from implant dopant channeling.
Furthermore, it is used to strain silicon wafer which
optimizes the performance and speed of the device.
Shipped in Type A packaging with regional licensing handled.
Calibrated to your delivery date, shipped from qualified reactor and cGMP partners.
DMF assistance and documentation for Canada, USA and Latin America filings.
Type A packaging, licensing and customs handled by our regional order desks.
Ask me anything about our products, services or company. I answer from this website.
Answers come from this website and may not be complete. Conversations are stored so we can improve them.
